wafer

Double-Side Polishing Borofloat 33 Wafers

Double-Side Polishing Borofloat 33 Wafers: Borofloat 33, CTE 3.25 x 10^-6 /K; TTV under 3 um. No MOQ, prototypes in 5-10 days, DFM review with every RFQ.

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Double-Side Polishing Borofloat 33 Wafers: Borofloat 33 (CTE 3.25 x 10^-6 /K, 350 nm – 2.0 um); Double-Side Polishing to TTV under 3 um. Single-piece prototypes to production volumes, quoted from your drawing.

Ask any process engineer what makes borofloat 33 difficult and the answer is specific: float tin side must be tracked when parts see coating or bonding steps. Our double-side polishing line is tooled around exactly that – planetary double-side polishers with carrier plates – holding TTV under 3 um on parts from 0.1 – 10 mm thick.

Specification envelope

Material Borofloat 33 (SCHOTT float production, wafer grade)
Thermal expansion (CTE) 3.25 x 10^-6 /K
Service temperature 450 C continuous
Transmission range 350 nm – 2.0 um
Density 2.23 g/cm3
Knoop hardness 480 kg/mm2
Refractive index 1.471 @ 587 nm
Stock thickness 0.70 – 25.4 mm
Maximum blank size 500 x 500 mm
Process Double-Side Polishing
Working tolerance TTV under 3 um
Minimum feature Ra below 0.5 nm both faces
Surface finish 60/40 to 20/10 both faces
Thickness window 0.1 – 10 mm
Edge condition edge-rounded before DSP
Wafer formats 2", 3", 4", 6", 8" and 12" with SEMI flats or notch
TTV under 3 – 5 um by format
RFQ inputs PDF/DXF/STEP drawing, quantity brackets, surface and edge spec

Manufacturing capability

The core strength of Double-Side Polishing is wafer-grade parallelism and sub-nanometer roughness on both faces simultaneously. The honest limit: parts must be round or near-round; strongly asymmetric outlines wedge in the carriers. Both belong on the drawing before quoting, not after.

One material, many routes: on Borofloat 33 we also quote edge grinding, laser cutting, etching, sandblasting, and multi-step drawings are the norm rather than the exception.

DFM notes from the shop floor

Before sending the RFQ, check these against your drawing:

  • Material note: float tin side must be tracked when parts see coating or bonding steps.
  • Process boundary: parts must be round or near-round; strongly asymmetric outlines wedge in the carriers.
  • Over-specification is the quiet budget killer: a 20/10 scratch-dig face costs roughly three times an 80/50 face, so grade each surface individually.

The full rules live in our tolerance design guide and holes and edges design guide.

Typical applications

Orders for double-side polishing borofloat 33 wafers cluster in microfluidic devices (chips, manifolds, via plates, bonded stacks); led packaging (groove covers, phosphor carriers, package windows); machine vision (camera windows, ring-light diffusers, calibration plates). Background reading on the underlying material science: SCHOTT BOROFLOAT product page.

Dimensions still moving? Configure this part live in the 3D + 2D builder below, or open the full custom glass machining 3D + 2D builder to start from a blank canvas.

Useful companion pages: 4 inch Borofloat wafers, wafer dicing process, custom microfluidic chip.

Buyer questions, answered

What equipment runs the double-side polishing work?

Planetary double-side polishers with carrier plates.

Is there a minimum order for double-side polishing borofloat 33 wafers?

No. Single prototypes are accepted, and pricing steps down at 10, 100 and 1,000 pieces.

How fast can prototypes ship?

Machined prototypes ship in 5 – 10 working days. Coated or bonded parts add 1 – 2 weeks depending on queue slots.

What files do you need for a quote?

A dimensioned PDF plus DXF or STEP geometry. If only a sketch exists, our drawing review service formalizes it before quoting.

Do parts ship with inspection data?

Dimensional reports, surface certificates and material certs per melt are available; specify the level on the RFQ.

Specifications on this page were last reviewed by our engineering team in September 2026.

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