Model: WGP-AI.
Overview
Wgp Visible Infrared Wire Grid Polarizers on Glass Substrates Nanoimprint Lithography: a waveplate / polariser / grating made from Eagle Xg. Optical / electrical data: wavelength 400-1600nm, transmittance Transmission values are measured at normal incidence at 450 nm, 550 nm, and 650 nm.. Surface quality 60/40 Scratch-Dig. Dimensions, material grade, coating and finish can be quoted to your drawing; the values above are the listed starting point.
Specifications
| Substrate | Eagle Xg |
|---|---|
| Surface Quality | 60/40 Scratch-Dig |
| Model NO. | WGP-AI |
| Dimensional Tolerance | ±0.2 mm |
| Polarization Wavelength Range | 400-1600nm |
| Extinction Ratio | 800:1(Average Over Wavelength Range) |
| Ar Coating | 450-1000nm |
| Angle of Incidence | 0° ± 20° |
| Thermal Expansion | 37.6 X 10-7/°C |
| Extinction ratio exceeding 800 | 1 ensures clean polarization separation |
| Transmission Reference | Transmission values are measured at normal incidence at 450 nm, 550 nm, and 650 nm. |
| Dimension Tolerance | Applies to length or diameter as applicable to the form factor. |
| CTE Scope | Coefficient of thermal expansion applies to the polarizer and glass cover only (excluding spacers/gaskets). |
| Reliability | Validated for 5,000 hours of continuous operation under specified conditions. |
| Deep silicon etching | aspect ratio 50:1 |
| ICP etching | dielectric-layer etching |
| RIE etching | dielectric-layer etching |
| Metal etching | dielectric-layer etching |
| Metals | Au, Ti, Ni, Cr, Al; |
| dielectric layers | TiN |
| Dielectric | TiO |
| Supplier | Kpl Controlled Environment Solution (Suzhou) Co., Ltd. |
Technical data
| Advantage | Description |
|---|---|
| Broad Wavelength Coverage | Polarization performance from 400 nm to 1600 nm, covering visible, near-IR, and SWIR bands |
| High Extinction Ratio | Extinction ratio exceeding 800:1 ensures clean polarization separation |
| High Transmission | Greater than 82% transmission maximizes optical throughput |
| Exceptional Thermal Stability | Operating temperature range from -40°C to 200°C for harsh environments |
| Wide Acceptance Angle | Performance maintained at incidence angles up to ±20° |
| Precision Surface Quality | Scratch/Dig specification of 60/40 ensures high optical clarity |
| Multiple Form Factors | Available in 12.5 mm square, 25 mm round, 25 mm square, and 50 mm square |
| Parameter | WP12.5L | WP25M | WP25L | WP50L |
| Substrate | EAGLE XG | EAGLE XG | EAGLE XG | EAGLE XG |
| Wavelength Range | 400–1600 nm | 400–1600 nm | 400–1600 nm | 400–1600 nm |
| Extinction Ratio | >800:1 | >800:1 | >800:1 | >800:1 |
| Transmission | >82% | >82% | ±2.5% | >82% |
| Form Factor | 12.5×12.5 mm | Ø25.0 mm | 25.0×25.0 mm | 50.0×50.0 mm |
| Dimension Tolerance | ±0.2 mm | +0.0/-0.1 mm | ±0.2 mm | ±0.2 mm |
| Clear Aperture | 10.5×10.5 mm | Ø19.0 mm | 21.0×21.0 mm | 48.0×48.0 mm |
| Thickness | 1.0 mm | 1.0 mm | 1.0 mm | 1.0 mm |
| Acceptance Angle | 0° ±20° | 0° ±20° | 0° ±20° | 0° ±20° |
| CTE | 37.6×10-7 /°C | 37.6×10-7 /°C | 37.6×10-7 /°C | 37.6×10-7 /°C |
| Surface Quality | 60/40 | 60/40 | 60/40 | 60/40 |
| Operating Temp. | -40 to 200°C | -40 to 200°C | -40 to 200°C | -40 to 200°C |
| Process | Substrate Size | Capability |
| MA8 photolithography | 4 / 6 / 8 inch | Minimum linewidth 1 μm |
| Stepper lithography | 4 inch | Minimum linewidth 0.7 μm |
| Electron-beam lithography (EBL) | 4 inch | Minimum CD 60 nm |
| Laser direct-writing & grayscale lithography | 4 / 6 / 8 inch | 3D grayscale exposure: 4095 levels; writing accuracy 250 nm |
| Dry etching | 4 / 6 / 8 inch | Deep silicon etching: aspect ratio 50:1 ICP etching: dielectric-layer etching RIE etching: dielectric-layer etching Metal etching: dielectric-layer etching |
| Wet etching | 4 / 6 / 8 inch | Silicon etching Metal etching |
| Magnetron sputtering | 4 / 6 / 8 inch | Metals: Au, Ti, Ni, Cr, Al; dielectric layers: TiN |
| Electron-beam evaporation | 4 / 6 / 8 inch | Metals: Au, Pt, Al, Cr, Ti, Ni, etc. |
| Atomic layer deposition (ALD) | 4 / 6 / 8 inch | Dielectric: TiO2, Al2O3, Ta2O5, HfO2, etc. |
| Nanoimprint lithography (NIL) | 4 / 6 / 8 inch | Minimum CD 50 nm |
| Anti-Sticking Treatment | 4 / 6 / 8 inch | CVD and spin-coating processes |
| Metrology & analytical measurement | Sample preparation | SEM, EDS, confocal microscopy, white-light interferometry, step profiler, IR microscopy, metallographic microscopy, etc. |
What to specify when you request a quote
- Material — listed as “Eagle Xg”; name the glass or crystal.
- Geometry — listed as “±0.2 mm”; give diameter, focal length or radii, angles and tolerances.
- Surface figure — listed as “60/40 Scratch-Dig”; quote surface figure (λ) and scratch-dig.
- Centring and edges — state centration and edge chamfer.
- Coating — listed as “450-1000nm”; list the band and reflectance or transmission target.
Engineering guides for this part
For material grades and coating options, see Alkali-Free Glass Options for Electronic & Display Substrate Buyers. How parts like this are machined and finished is covered in Chalcogenide Glass Coating for IR Optical Components. For an application example, read Alkali-Free Glass Wafers for Appliance Display Substrates. A related standard product is Alkali-Free Glass Wafers.
FAQ
What is the Wgp Visible Infrared Wire Grid Polarizers on Glass Substrates Nanoimprint Lithography made of? expand_more
It is listed as Eagle Xg. Other grades can be quoted if your application needs different transmission, thermal or chemical properties.
What optical or electrical performance does it have? expand_more
Listed values: wavelength 400-1600nm, transmittance Transmission values are measured at normal incidence at 450 nm, 550 nm, and 650 nm.. Confirm the values at your operating wavelength, angle and temperature when you request a quote.
What should I include in a quote request? expand_more
Include material, geometry, surface figure, centring and edges and coating, plus quantity and a drawing if the part is custom.
