Application: Medical, Civil, Labs, Astronomy, Laser, etc. Model: RAY-OM063#.
Overview
High-Energy Excimer Laser Mirrors/Optcial Excimer Laser Mirrors/Optical Laser Lens is an optical lens in High Purity Fused Silica (High Purity UV Fused Silica substrate). Listed geometry: thickness 6.35mm, 9.65mm or Custom Manufacturing, aspheric shape. Optical / electrical data: wavelength 248nm, 308nm, 351-353nm. Coating: High reflectivity dielectric coatings; surface quality 10-5 Scratch-Dig; flatness Lambda/10 at 632.8nm. It is used in Medical, Civil, Labs, Astronomy and Laser. Dimensions, material grade, coating and finish can be quoted to your drawing; the values above are the listed starting point.
Specifications
| Material | High Purity Fused Silica |
|---|---|
| Substrate | High Purity UV Fused Silica |
| Shape | Aspheric |
| Thickness | 6.35mm, 9.65mm or Custom Manufacturing |
| Wavelength Range | 248nm, 308nm, 351-353nm |
| Coating | High reflectivity dielectric coatings |
| Surface Quality | 10-5 Scratch-Dig |
| Application | Medical, Civil, Labs, Astronomy, Laser, etc |
| Model NO. | RAY-OM063# |
| Surface Flatness | Lambda/10 at 632.8nm |
| Coating Type | Ultrahard Dielectric Coatings. |
| Products Name | High-Energy Excimer Laser Mirrors |
| Alias | High-Energy Excimer Laser Mirrors, Excimer Laser Mirrors, Excimer laser reflectors, High-energy excimer laser reflector, Laser reflector, etc |
| Mirrors Substrates | High purity fused silica substrate |
| Optional I | High purity fused silica substrate |
| Optional II | Equivalent High purity fused silica substrate |
| Applying Fields I | high energy excimer lasers |
| Applying Fields II | Other |
| Main Characters | 1).High reflectivity dielectric coatings |
| Main Optical Tech Specification | Tech Data |
| Popular Physical Size Specification | Mirror Size |
| Main Cooperation Materials Manufacturers | CORNING, OHARA, SCHOTT, LEONI, AGC,HELLMA, NIKON,VITRON,C-LASER,ETC |
| Supplier | Shanghai Rui Tai Photoelectric Technology Co., Ltd. |
Technical data
| Optional I: | High purity fused silica substratefrom CORNING, OHARA, SCHOTT, LEONI, AGC,HELLMA, NIKON,VITRON,ETC |
|---|---|
| Optional II: | Equivalent High purity fused silica substrateMade in China, C-laser own brands |
| Applying Fields I: | high energy excimer lasers |
|---|---|
| Applying Fields II: | Other |
| ***** |
| Tech Data | Description |
|---|---|
| Wavelength Range | 248 nm, 308 nm, 351-353 nm |
| Angle of Incidence | – |
| Coating Type | Ultrahard dielectric coatings. |
| Reflectivity | – |
| Damage Threshold | – |
| Material | UV Grade Fused Silica |
| Surface Quality | 10-5 scratch-dig |
| Surface Flatness | λ/10 at 632.8 nm |
| Clear Aperture | ≥central 80% of diameter |
| Chamfers | – |
| Chamfers Angle Tolerance | 45° ±15° |
| Wedge | ≤3 arc min |
What to specify when you request a quote
- Material — listed as “High Purity Fused Silica”; name the glass or crystal.
- Geometry — listed as “Mirror Size”; give diameter, focal length or radii, angles and tolerances.
- Surface figure — listed as “10-5 Scratch-Dig”; quote surface figure (λ) and scratch-dig.
- Centring and edges — state centration and edge chamfer.
- Coating — listed as “High reflectivity dielectric coatings”; list the band and reflectance or transmission target.
Engineering guides for this part
For material grades and coating options, see Fused Silica Windows for UV and Laser Optical Systems. How parts like this are machined and finished is covered in Flat Glass Polishing Process for Precision Substrates. For an application example, read How to Handle and Maintain Precision Glass Components in Laser Systems. Before sending a drawing, check Fused Silica Refractive Index: Key to Optical Design Improvement. A related standard product is Fused Silica Glass Wafers (2–12", JGS1/JGS2).
