wafer

Edge Grinding Fused Silica Wafers

Edge Grinding Fused Silica Wafers: Fused Silica, CTE 0.55 x 10^-6 /K; chamfer +/-0.05 mm. No MOQ, prototypes in 5-10 days, DFM review with every RFQ.

Edge Grinding Fused Silica Wafers

Edge Grinding Fused Silica Wafers – Fused Silica (CTE 0.55 x 10^-6 /K, 185 nm – 2.5 um); Edge Grinding to chamfer +/-0.05 mm. No minimum order; DFM review included with every RFQ.

Ask any process engineer what makes fused silica difficult and the answer is specific: its hardness and brittleness demand diamond tooling and controlled feeds. Our edge grinding line is tooled around exactly that – CNC edge grinders with profiled diamond wheels – holding chamfer +/-0.05 mm on parts from 0.1 – 25 mm thick.

Specification envelope

Material Fused Silica (JGS1 (UV), JGS2 (standard), JGS3 (IR))
Thermal expansion (CTE) 0.55 x 10^-6 /K
Service temperature 1,100 C continuous
Transmission range 185 nm – 2.5 um
Density 2.20 g/cm3
Knoop hardness 500 kg/mm2
Refractive index 1.458 @ 587 nm
Stock thickness 0.10 – 50 mm
Maximum blank size 450 x 450 mm
Process Edge Grinding
Working tolerance chamfer +/-0.05 mm
Minimum feature 0.1 mm chamfer leg
Surface finish ground C or R profile, polish option
Thickness window 0.1 – 25 mm
Edge condition C-chamfer, R-round, pencil or OG profile
Wafer formats 2", 3", 4", 6", 8" and 12" with SEMI flats or notch
TTV under 3 – 5 um by format
RFQ inputs PDF/DXF/STEP drawing, quantity brackets, surface and edge spec

Capabilities and limits

The core strength of Edge Grinding is edge strength – a finished chamfer roughly doubles the bend strength of a cut edge. The honest limit: profiles below 0.1 mm leg length are lapped by hand and priced per edge. Both belong on the drawing before quoting, not after.

One material, many routes: on Fused Silica we also quote etching, double-side polishing, polishing, and multi-step drawings are the norm rather than the exception.

Design guidance

The shop-floor rules that matter here:

  • Material note: its hardness and brittleness demand diamond tooling and controlled feeds.
  • Process boundary: profiles below 0.1 mm leg length are lapped by hand and priced per edge.
  • Over-specification is the quiet budget killer: a 20/10 scratch-dig face costs roughly three times an 80/50 face, so grade each surface individually.

The full rules live in our tolerance design guide and holes and edges design guide.

Who orders this

The recurring buyers of edge grinding fused silica wafers: aerospace optics (sensor windows, star-tracker flats, radiation-tolerant ports); optical sensors (sensor windows, filter caps, lens covers); microfluidic devices (chips, manifolds, via plates, bonded stacks). Background reading on the underlying material science: RP Photonics: fused silica.

The fastest route to a quote is geometry: use the 3D builder below, draw a dimensioned 2D drawing from it, or open the site-wide custom glass machining 3D + 2D builder for fully custom parts.

Engineers scoping this work usually also review wafer dicing process, holes and edges design guide, microfluidic glass applications.

Frequently asked questions

What equipment runs the edge grinding work?

CNC edge grinders with profiled diamond wheels.

Is there a minimum order for edge grinding fused silica wafers?

No. Single prototypes are accepted, and pricing steps down at 10, 100 and 1,000 pieces.

How fast can prototypes ship?

Machined prototypes ship in 5 – 10 working days. Coated or bonded parts add 1 – 2 weeks depending on queue slots.

What files do you need for a quote?

A dimensioned PDF plus DXF or STEP geometry. If only a sketch exists, our drawing review service formalizes it before quoting.

Specifications on this page were last reviewed by our engineering team in September 2026.

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FREQUENTLY ASKED QUESTIONS
Which fused silica grade should I choose — JGS1, JGS2 or JGS3?

JGS1 offers deep-UV transmission from about 185 nm (best for DUV lithography and UV laser optics). JGS2 transmits well from about 220 nm for standard UV-visible use at lower cost. JGS3 is optimized for visible-to-infrared and high-power laser work. The builder exposes a transmission-band requirement so you can specify the grade by application.

What wafer diameters and thicknesses are supported?

Common diameters are 2, 3, 4 and 6 inch (note 1 inch = 25.0 mm for quartz wafers, so a 4 inch wafer is 100 mm). Typical thicknesses are 200, 500, 700 and 1000 µm, with tighter thickness tolerance and TTV specifiable for polished optical grades.

Can I specify TTV, surface quality and a flat or notch?

Yes. You can set total thickness variation, scratch-dig surface quality (down to 40/20 or 20/10 for optical grade), single- or double-side polish, and a primary flat or notch for orientation.

Need a different product family? Open the full 3D + 2D builder.

Engineering Review

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